专利名称：POLYMERIC MATERIALS WITH NEGATIVE
PHOTOELASTIC CONSTANTS
发明人：Praveen Agarwal,Justice Alaboson,Shih-Wei
Chang,John W. Lyons,Kathleen M.O'Connell,Caroline Woelfle-Gupta,WeijunZhou
申请号：US15534094申请日：20151207
公开号：US20170362459A1公开日：20171221
摘要：A polymeric material having a negative photoelastic constant. The polymericmaterial comprises: (a) a polymer comprising polymerized units of 2-vinylpyridine, 4-vinylpyridine, methyl methacrylate or a combination thereof; (b) a C-Caliphatic polycycliccompound; and (c) an organic compound having a boiling point of at least 200° C.
申请人：Rohm and Haas Electronic Materials LLC,Dow Global Technologies LLC
地址：Marlborough MA US,Midland MI US
国籍：US,US
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